The researchers integrated over 1 million RRAM cells and 2 million carbon nanotube field-effect transistors, making the most complex nanoelectronic system ever made with emerging nanotechnologies.

The RRAM and carbon nanotubes are built vertically over one another, making a new, dense 3-D computer architecture with interleaving layers of logic and memory. By inserting ultradense wires between these layers, this 3-D architecture promises to address the communication bottleneck.

Such an architecture is not possible with existing silicon-based technology, according to the paper's lead author, Max Shulaker, who is a core member of MIT's Microsystems Technology Laboratories. "Circuits today are 2-D, since building conventional silicon transistors involves extremely high temperatures of over 1,000 degrees Celsius," says Shulaker. "If you then build a second layer of silicon circuits on top, that high temperature will damage the bottom layer of circuits."